Transverse electric-field type liquid crystal display...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000, C430S030000

Reexamination Certificate

active

07423723

ABSTRACT:
A process of manufacturing a liquid crystal display device of transverse electric-field type, wherein a halftone photomask which is used to form a photoresist pattern has a fully light-shielding area preventing UV irradiation of a portion of an active matrix substrate in which a thin-film transistor element is to be formed, so that the photoresist pattern includes a positive resist portion which has a first thickness and which is formed on the above-indicated portion of the substrate. The halftone mask further has a fully light-transmitting area which permits fully UV transmission therethrough to provide the photoresist pattern with a resist-free area which corresponds to a portion of the substrate in which a contact hole serving as a third connection portion connecting an external scanning-line driver circuit and a scanning-line terminal portion through a junction electrode is to be formed. The photoresist pattern also has a positive resist portion which is formed in the other portion of the substrate and which has a second thickness smaller than the first thickness. Also disclosed in a scan-exposing device used in the process is also disclosed.

REFERENCES:
patent: 4500615 (1985-02-01), Iwai
patent: 6335276 (2002-01-01), Park et al.
patent: 2001/0040648 (2001-11-01), Ono et al.
patent: 2002/0109827 (2002-08-01), Nishi
patent: 9-106075 (1997-04-01), None
patent: 09-129547 (1997-05-01), None
patent: 10-10494 (1998-01-01), None
patent: 2000-66240 (2000-03-01), None
patent: 2000-066240 (2000-03-01), None

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