Chemical apparatus and process disinfecting – deodorizing – preser – Control element responsive to a sensed operating condition – Control element is fluid pressure sensitive
Patent
1984-02-13
1987-05-26
Lacey, David L.
Chemical apparatus and process disinfecting, deodorizing, preser
Control element responsive to a sensed operating condition
Control element is fluid pressure sensitive
422243, 422310, 312 311, 414217, 206207, B65G 6920, B65D 8124
Patent
active
046684840
ABSTRACT:
An improved transport container for semiconductor wafers includes chamber structure of sheet material with structure in the chamber for supporting the semiconductor wafers. The chamber includes a first access door portion through which the semiconductor wafers may be introduced into and removed from the chamber, a coupling for attaching the chamber to a source of inert gas for flowing inert gas through the coupling to create a positive pressure in the chamber, and a port spaced from the coupling for continuously releasing gas from the chamber preferably at a rate in the range of one-half to ten cubic centimeters per minute so that the wafers are exposed to a flowing, low but positive pressure inert gas environment during storage and transport.
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