Transparent substrate with transparent conductive film,...

Details Transparent substrate with transparent conductive film,... Transparent substrate with transparent conductive film,...

2004-11-18

2009-10-27

Turocy, David (Department: 1792)

Coating processes

Electrical product produced

Metallic compound coating

C427S109000, C427S165000

Reexamination Certificate

active

07608294

ABSTRACT:
The present invention provides a transparent substrate with a transparent conductive film that is thin but has a surface with concavities and convexities of increased height. A manufacturing method of the present invention includes a process of forming a transparent conductive film containing crystalline metal oxide as its main component on a transparent substrate by a pyrolytic oxidation method. In the method, a gaseous material containing a metal compound, an oxidizing material, and hydrogen chloride is supplied onto the transparent substrate. The process includes sequentially: a first step in which a mole ratio of the hydrogen chloride to the metal compound in the gaseous material is 0.5 to 5; and a second step in which the mole ratio is 2 to 10 and is higher than the mole ratio to be employed in the first step. With the present invention, a transparent substrate with a transparent conductive film can be provided that has a haze ratio of at least 15% and includes a transparent conductive film whose thickness is 300 nm to 750 nm.

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