Transparent substrate provided with a stack of layers...

Stock material or miscellaneous articles – Composite – Of metal

Reexamination Certificate

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Details

C428S412000, C428S480000, C428S698000, C428S699000, C428S701000, C204S192100, C204S192140, C204S192260

Reexamination Certificate

active

06503636

ABSTRACT:

The invention relates to a stack of layers reflecting, at least in part, in the infrared range and reflecting, in particular, heat radiation, for transparent substrates, comprising at least one “functional” layer and “antireflection” layers which are arranged on both sides of the silver layer.
In the context of the invention, the term “functional layer(s)” is intended to mean the layer or layers which, in the stack, have the properties of reflection in the infrared range and/or in the solar radiation range, and which are generally metallic, more particularly based on a noble metal such as Ag (if appropriate also containing minority constituents, for example as small proportion of another metal). By way of explanation, silver layers have high reflectivity in the infrared range and their sunproofing or low-emission property can thus be utilized.
In the scope of the invention, the term “antireflection layers” is intended to mean a layer, or a superposed series of layers, having in particular the function of adjusting the optical appearance of the stack, with a view to reducing its light reflection, and generally based on dielectrics such as metal compounds, for example metal oxides.
The present invention thus concerns stacks of the (antireflection layer/functional layer/ antireflection layer) type, a sequence which may if appropriate be repeated n times, with n=1, 2, 3, . . . . It should be noted that thin layers, generally of metal, which are intended to protect and/or promote adhesion of the functional layers, may also be provided at the interfaces between the antireflection layers and the functional layers. These are sometimes referred to by the term “sacrificial layers” when they are on the functional layer and when they oxidize at least partially following the subsequent deposition of an oxide-based layer by reactive sputtering in the presence of oxygen.


REFERENCES:
patent: 4985312 (1991-01-01), Nakashima et al.
patent: 6045896 (2000-04-01), Boire et al.
patent: 39 41 027 (1990-07-01), None
patent: 44 22 830 (1995-01-01), None
patent: 05 43 077 (1992-04-01), None
patent: 0 698 585 (1996-02-01), None
patent: 0 718 250 (1996-06-01), None
patent: 0 747 330 (1996-12-01), None
Patent Abstracts of Japan, vol. 013, No. 512 (M-893, Nov. 16, 1989.

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