Transparent substrate for mask blank and mask blank

Details Transparent substrate for mask blank and mask blank Transparent substrate for mask blank and mask blank

2005-09-13

2009-12-22

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07635544

ABSTRACT:
In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.

REFERENCES:
patent: 2001/0055733 (2001-12-01), Irie et al.
patent: 60-39047 (1985-03-01), None
patent: 63-8900 (1988-03-01), None
patent: 1-39653 (1989-08-01), None
patent: 8-31723 (1996-02-01), None
patent: 2000-356849 (2000-12-01), None
patent: 2002-90978 (2002-03-01), None
patent: 2002-162727 (2002-06-01), None
patent: 2003-81654 (2003-03-01), None
patent: 2003173019 (2003-06-01), None
patent: 2003-264225 (2003-09-01), None
patent: 2003-280168 (2003-10-01), None
patent: 2002286797 (2003-10-01), None

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