Transparent mask plate for charged particle beam exposure appara

Details Transparent mask plate for charged particle beam exposure appara Transparent mask plate for charged particle beam exposure appara

1993-08-20

1995-07-11

Evans, Geoffrey S.

Electric heating

Metal heating

By arc

492 2, 430 5, H01J 3704, G03F 900

Patent

active

054323142

ABSTRACT:
A transparent mask plate used in a charged particle beam exposure apparatus includes a base plate, an exposure pattern area, and a calibration area. The exposure pattern area is formed in the base plate and has a plurality of transparent patterns for shaping a cross section of a charged particle beam into a block pattern. The calibration area is formed in the base plate, and has a plurality of transparent patterns used for obtaining a condition for deflecting the charged particle beam. The plurality of transparent patterns formed in the calibration area are arranged at the same pitch as the plurality of transparent patterns formed in the exposure pattern area. Each of the plurality of transparent patterns formed in the calibration area corresponds to one of the plurality of transparent patterns formed in the exposure pattern area.

REFERENCES:
patent: 4647782 (1987-03-01), Wada et al.
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5105089 (1992-04-01), Yamada
patent: 5173582 (1992-12-01), Sakamoto et al.
patent: 5288567 (1994-02-01), Sakamoto et al.

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