Transparent laminate, method for producing the same, and...

Coating processes – Optical element produced – Transparent base

Reexamination Certificate

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C427S109000, C427S124000, C427S125000, C427S166000, C427S250000, C427S255700, C427S404000, C427S419300, C204S192100, C204S192260, C204S192280, C359S360000, C359S588000, C359S885000

Reexamination Certificate

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06855369

ABSTRACT:
In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a surface of the laminate of the n thin-film units, each of the n thin-film units consisting of a high-refractive-index thin film and a silver transparent conductive thin film. When the silver transparent conductive thin films are deposited by a vacuum dry process, the temperature T(K) of the transparent substrate at the time of film deposition is set to be in a range 340≦T≦410, whereby the transparent laminate having a standard deviation of visible light transmittance which is not larger than 5% in a wave range of from 450 to 650 nm can be produced.

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