Compositions – Electrically conductive or emissive compositions – Metal compound containing
Reexamination Certificate
2007-10-02
2007-10-02
Kopec, Mark (Department: 1751)
Compositions
Electrically conductive or emissive compositions
Metal compound containing
C252S521300, C204S192150
Reexamination Certificate
active
11447873
ABSTRACT:
A transparent conductive thin film which can be produced easily by sputtering or the like with a sintered target, needs no post-treatment such as etching or grinding, is low in resistance and excellent in surface smoothness, and has a high transmittance in the low-wavelength region of visible rays; and transparent, electroconductive substrate for a display panel and an organic electroluminescence device excellent in light-emitting characteristics, both including the transparent conductive thin film. More particularly, a transparent conductive thin film comprising indium oxide as the major component and silicon as a dopant, having a substantially amorphous structure, wherein silicon is incorporated at 0.5 to 13% by atom on indium and silicon totaled; and a transparent conductive thin film comprising indium oxide as the major component and tungsten and germanium, wherein tungsten is incorporated at a W/In atomic ratio of 0.003 to 0.047 and germanium is incorporated at a Ge/In atomic ratio of 0.001 to 0.190.
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Toshiro Maruyama, et al.,Germanium-and Silicon-doped Indium-oxide Thin Films Prepared by Radio-frequency Magnetron Sputtering, Appl. Phys. Lett., vol. 64, No. 11, Mar. 14, 1994, pp. 1395-1397.
Kopec Mark
Sumitomo Metal & Mining Co., Ltd.
Westerman, Hattori, Daniels & Adrian , LLP.
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