Transparent conductive laminate and process of producing the...

Stock material or miscellaneous articles – Structurally defined web or sheet – Physical dimension specified

Reexamination Certificate

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C428S332000, C428S336000, C428S688000, C428S689000, C428S923000, C428S926000

Reexamination Certificate

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06908666

ABSTRACT:
A transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding, and a process for producing the same. The transparent conductive layer is excellent in transparency and wet heat confidence and is not excessively low in specific resistivity. The transparent conductive laminate includes a substrate comprising an organic polymer molding having formed thereon a completely crystallized, transparent conductive layer comprising an In—Sn composite oxide having an amount of Sn atom of 1 to 6% by weight based on the total weight of In atom and Sn atom and having a film thickness of 15 to 50 nm, a Hall mobility of 30 to 45 cm2/V-S, and a carrier density of from 2×1020/cm3to 6×1020/cm3.

REFERENCES:
patent: 5225273 (1993-07-01), Mikoshiba et al.
patent: 6617056 (2003-09-01), Hara et al.
patent: 3-15536 (1991-03-01), None
patent: 2000-144379 (2000-05-01), None
patent: WO00/51139 (2000-08-01), None
XP-000595205—T. Minami et al., “Physics of very thin ITO conducting films with high transparency prepared by DC magnetron sputtering” Thin Solid Films 270 (1995), pp. 37-42.
XP-002255051—N. Danson et al., “Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates”, Surface and Coatings Technology 99 (1998), pp. 147-160.
XP-002255052—“Enhanced Electrical Conductivity of Indium Tin Oxide Films by Ag Addition”, Jpn. J. Appl. Phys. vol. 37 (1998), pp. 34-38.
European Search Report dated Oct. 9, 2003.

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