Transmitted wavefront metrology of optics with high aberrations

Details Transmitted wavefront metrology of optics with high aberrations Transmitted wavefront metrology of optics with high aberrations

2007-01-11

2009-06-09

Lyons, Michael A (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07545511

ABSTRACT:
Disclosed herein is an interferometry device and associated method and computerized media for testing optical components including those with high aberrations, comprising: situating an optical component under test between a source of a spherical test wavefront and a spherical reference mirror; propagating a spherical test wavefront, whereby an axial line is defined by a direction of propagation of said wavefront; deriving a substantially complete first-tilt-alignment wavefront metrology of the optical component under test from a plurality of first-tilt-alignment interferograms obtained with the optical component under test held fixed at a first predetermined tilt angle relative to a direction of propagation of said wavefront; and varying an axial displacement between the optical component under test and the spherical reference mirror to obtain each first-tilt-alignment interferogram. By varying the tilt angle, one can also derive a substantially complete surface metrology of the optical component under test.

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