Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-09-26
1999-06-22
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
059142030
ABSTRACT:
A transmission modulation mask comprising a first pattern formed of opaque or non light transmitting material and a second pattern formed of partially transmitting material. The light passing through the transmission modulation mask forms interference patterns which improve the edge definition and depth of focus of the image formed on a semiconductor wafer. The transmission modulation mask is particularly useful for small contact hole formation requiring a high degree of dimensional control such as the formation of stacked capacitors for DRAM circuits.
REFERENCES:
patent: 5429896 (1995-07-01), Hasegawa et al.
patent: 5439765 (1995-08-01), Nozue
patent: 5478679 (1995-12-01), Loong et al.
patent: 5482799 (1996-01-01), Isao et al.
patent: 5679484 (1997-10-01), Ito et al.
patent: 5725975 (1998-03-01), Nakamura et al.
Ackerman Stephen B.
Prescott Larry J.
Rosasco S.
Saile George O.
Vanguard International Semiconductor Corporation
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