Coating apparatus – Gas or vapor deposition
Patent
1998-04-02
2000-07-18
Ahmad, Nasser
Coating apparatus
Gas or vapor deposition
118723R, 118726, 156345P, 20429812, 20429813, 20429818, C23C 1400
Patent
active
060902078
ABSTRACT:
A film deposition system for coating large surfaces includes a target translated in parallel to the surface, and an energetic beam (laser beam) directed in parallel to the surface to be coated and impinging on the target, so that a plasma plume extends from the target to the surface to be coated. Translational motion of the target relative to the surface to be coated causes the plasma plume to scan over the surface and to deposit a thin film of a material from the target on the surface. Surfaces of unlimited size can be coated by this technique. The system provides short target-surface distances, high deposition rates, and can utilize small targets. An arrangement including several independently controlled and moving targets is utilized for coating surfaces having complicated shapes.
REFERENCES:
patent: 5672211 (1997-09-01), Mai
J.A. Greer, in Pulsed Laser Deposition of Thin Films, edited by D.B. Chrisey and G.K. Hubler (Wiley, New York, 1994), pp. 293-311.
K.H. Wu, et al., "Preparation of Large Area and Investigation of Initial Film Growth of YBa.sub.2 Cu.sub.3 O.sub.7 by Scanning Pulsed Laser Deposition", Applied Physics Letters, vol. 69, No. 3, Jul. 15, 1996, pp. 421-423.
M. Lorenz, et al., "Large-area Double-Side Pulsed Laser Deposition of YBa.sub.2 Cu.sub.3 O.sub.7-x Thin Films on 3-in. Sapphire Wafers", Applied Physics Letters, vol. 68, No. 23, Jun. 3, 1996, pp. 3332-3334.
Green Steven M.
Knauss Lee A.
Ahmad Nasser
Neocera, Inc.
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