Liquid purification or separation – Processes – Preventing – decreasing – or delaying precipitation,...
Patent
1989-02-27
1990-10-30
Fisher, Richard V.
Liquid purification or separation
Processes
Preventing, decreasing, or delaying precipitation,...
210696, 210699, 210744, 210745, 210759, 436 56, 422 3, 422 62, 7386107, C02F 100
Patent
active
049667114
ABSTRACT:
Methods for utilizing transition metals as tracers in aqueous liquid systems are provided by this invention. Transition metals with low background levels in system waters are identified as preferred when soluble in said aqueous liquid systems. The transition metals show low levels of deposition on equipment scale and provide reliable information as to the process history of the liquid systems.
REFERENCES:
patent: 4209398 (1980-06-01), Ii et al.
patent: 4264329 (1981-04-01), Beckett
patent: 4664884 (1987-05-01), Mullins et al.
patent: 4777140 (1988-10-01), Rudnick
patent: 4783314 (1988-11-01), Hoots et al.
Multifunctional Liquid Cooking Water Treatment, Nalco 2808.
Multifunctional Liquid Cooling Water Treatment, Nalco 2575.
Mechanisms of Organic Inhibitors Used in Cooling Water Corrosion Control.
Anayltical Use of Luminescence Induced Ultrasonically in Solution.
Chem Abstract CA89(6):48676q.
Chem Abstract CA93(16):160598z.
Chem Abstract 86(22):160888z.
Chem Abstract CA103(6):44359y.
Chem Abstract CA78(10):66481z.
Chem Abstract CA98(16):13688v.
Chem Abstract CA98(14):118849k.
Chem Abstract CA96(2):11308q.
Chem Abstract CA79(6):34978w.
Chem Abstract CA102(10):89283q.
Banks Rodney H.
Hoots John E.
Johnson Donald A.
Fisher Richard V.
Nalco Chemical Company
Shideler Krisanne
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