Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Diffusion transfer process – element – or identified image...
Patent
1979-08-02
1982-02-02
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Transfer procedure between image and image layer, image...
Diffusion transfer process, element, or identified image...
430155, 430156, 430203, 430211, 430273, 430333, 430338, 430339, 430495, 430502, 430936, 430341, G03C 172
Patent
active
043140190
ABSTRACT:
A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer. By the selection of amine-responsive reducing agent precursors, the amines released by the cobalt(III)complexes cause an amplified image.
REFERENCES:
patent: 1897843 (1933-02-01), Hickman et al.
patent: 1962307 (1934-06-01), Hickman et al.
patent: 2027229 (1936-01-01), Hinman
patent: 2084420 (1937-06-01), Weyde
patent: 2702243 (1955-02-01), Schmidt
patent: 3102811 (1963-09-01), Barney
patent: 3152903 (1964-10-01), Shepard et al.
patent: 3224878 (1965-12-01), Klimkowski et al.
patent: 3353984 (1967-11-01), Landau
patent: 3383212 (1968-05-01), MacLachlan
patent: 3469984 (1969-09-01), Bialczak
patent: 3567453 (1971-03-01), Borden
patent: 3615565 (1971-10-01), Gerlach
patent: 3655383 (1972-04-01), Shepard et al.
patent: 3658534 (1972-04-01), Ishitani et al.
patent: 3679415 (1972-07-01), McNally
patent: 3765883 (1972-10-01), Endo et al.
patent: 3856524 (1974-12-01), Bissonette
patent: 3880659 (1975-04-01), Bailey et al.
patent: 3887372 (1975-06-01), Bailey
patent: 3887374 (1965-07-01), Brongo et al.
Bordon, "Review of Light-Sensitive Tetraarylborates", Photographic Science and Engineering, vol. 16, No. 4, 1972.
Research Disclosure, vol. 117, Pub. No. 11711, p. 8, 1/1974.
Research Disclosure, vol. 126, Pub. No. 12617, pp. 12-30, 10/1974.
Adin Anthony
Fleming James C.
Bowers Jr. Charles L.
Eastman Kodak Company
Schmidt Dana M.
LandOfFree
Transition metal photoreduction systems and processes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Transition metal photoreduction systems and processes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Transition metal photoreduction systems and processes will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1821842