Transistors, semiconductor devices, assemblies and...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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C257S374000, C257S501000

Reexamination Certificate

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08044479

ABSTRACT:
Embodiments disclosed herein include methods in which a pair of openings are formed into semiconductor material, with the openings being spaced from one another by a segment of the semiconductor material. Liners are formed along sidewalls of the openings, and then semiconductor material is isotropically etched from bottoms of the openings to merge the openings and thereby completely undercut the segment of semiconductor material. Embodiments disclosed herein may be utilized in forming SOI constructions, and in forming field effect transistors having transistor gates entirely surrounding channel regions. Embodiments disclosed herein also include semiconductor constructions having transistor gates surrounding channel regions, as well as constructions in which insulative material entirely separates an upper semiconductor material from a lower semiconductor material.

REFERENCES:
patent: 4845048 (1989-07-01), Tamaki
patent: 5681773 (1997-10-01), Tseng
patent: 5801083 (1998-09-01), Yu et al.
patent: 5963789 (1999-10-01), Tsuchiaki
patent: 5972758 (1999-10-01), Liang
patent: 6232202 (2001-05-01), Hong
patent: 6285057 (2001-09-01), Hopper
patent: 6521538 (2003-02-01), Soga et al.
patent: 6716757 (2004-04-01), Lin et al.
patent: 6921982 (2005-07-01), Joshi et al.
patent: 7005347 (2006-02-01), Bhalla et al.
patent: 7220640 (2007-05-01), Kim
patent: 7326634 (2008-02-01), Lindert et al.
patent: 7422960 (2008-09-01), Fischer
patent: 2002/0031898 (2002-03-01), Gonzalez et al.
patent: 2002/0135549 (2002-09-01), Kawata
patent: 2003/0190766 (2003-10-01), Gonzalez et al.
patent: 2004/0110358 (2004-06-01), Lee
patent: 2004/0113230 (2004-06-01), Divakaruni et al.
patent: 2005/0029619 (2005-02-01), Forbes
patent: 2005/0199932 (2005-09-01), Abbott et al.
patent: 2005/0285149 (2005-12-01), Chang
patent: 2006/0292787 (2006-12-01), Wang et al.
patent: 2007/0148934 (2007-06-01), Cho et al.
patent: 2008/0017931 (2008-01-01), Shih et al.
patent: 10157785 (2003-06-01), None
patent: 0059264 (1981-12-01), None
patent: 1229579 (2002-08-01), None
patent: W02005/117073 (2005-12-01), None
patent: W02006/109265 (2006-10-01), None
patent: W02006/117734 (2006-11-01), None
PCT/US2007/016947, Feb. 18, 2008, Int'l Search Report.
PCT/US2007/016947, Feb. 18, 2008, Written Opinion of the ISA.
PCT/US2006/020877, May 24, 2006, Int'l Search Report.
Yeo, Kyoung Hwan, et al., “80nm 512M DRAM with Enhanced Data Retention Time Using Partially-Insulated Cell Array Transistor (PiCAT)”, 2004 Symposium on VLSI Technology Digest of Technical Papers, Sep. 2004, pp. 30-31.
Kim, J.Y., et al., “S-RCAT (Sphere-shaped-Recess-Channel-Array Transistor) Technology for 70nm DRAM feature size and beyond” 2005 Symposium on VLSI Technology Digest of Technical Papers, pp. 34-35.

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