Transistor structure

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357 238, 357 2313, 357 41, H01L 2978

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048455369

ABSTRACT:
The invention relates to a field-effect transistor (1;20) with insulated gate electrode (9;30) which comprises in a semiconductor body (5) a drain diffusion zone (2) connected to a drain electrode (6;32) and a source diffusion zone (3) which is disposed spaced from the drain diffusion zone (2) for forming a channel zone (4) and which is connected to a source electrode (7). The gate electrode (9;32) of said field-effect transistor is disposed on a gate insulating layer (8) over the channel zone (4). For protecting the transistor against high voltages produced by electrostatic charging the drain diffusion zone (2) of the transistor and/or the source diffusion zone (3) between the respective associated electrode (6,7;32) and the channel zone (4) is divided into a plurality of parallel strips (10,11). Integrated circuits are also protected against destruction by high voltages if the insulated gate field-effect transistors connected to their output terminals are constructed in the manner outlined above.

REFERENCES:
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IBM Technical Disclosure Bulletin, vol. 24, No. 1B, Jun. 1981, pp. 864, 865, New York; P. W. Betz et al.
Patents Abstracts of Japan, vol. 6, No. 140, (E-121), (1018), Jun. 29th, 1982; & JP-A-57 63 861, (Nippon Denki, KK).
IBM Technical Disclosure Bulletin, vol. 8, No. 2, Jul. 1965, pp. 317-318, New York, U.S. L. W. Atwood.
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