Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-05-23
2006-05-23
Le, Dung A. (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S048000, C349S149000
Reexamination Certificate
active
07049162
ABSTRACT:
A fabrication process for transistor array substrates of different sizes on a common substrate provides quality control, yield, and space efficiency advantages. In particular, a four-mask process, including a mask with diffraction slits, may be employed to fabricate transistors that share common channel characteristics for each of the transistor array substrates.
REFERENCES:
patent: 6762081 (2004-07-01), Yamazaki et al.
patent: 6797535 (2004-09-01), Tanabe
Jung Jo-Hann
Kang Kyung-Kyu
Kim Jeong-Rok
Nam Myung-Woo
Shin Jae-Deuk
Brinks Hofer Gilson & Lione
Le Dung A.
LG. Philips LCD Co. Ltd.
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