Transistor array substrate fabrication for an LCD

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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C438S048000, C349S149000

Reexamination Certificate

active

07049162

ABSTRACT:
A fabrication process for transistor array substrates of different sizes on a common substrate provides quality control, yield, and space efficiency advantages. In particular, a four-mask process, including a mask with diffraction slits, may be employed to fabricate transistors that share common channel characteristics for each of the transistor array substrates.

REFERENCES:
patent: 6762081 (2004-07-01), Yamazaki et al.
patent: 6797535 (2004-09-01), Tanabe

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