Transforming metrology data from a semiconductor treatment...

Details Transforming metrology data from a semiconductor treatment... Transforming metrology data from a semiconductor treatment...

2006-02-07

2008-12-16

Barlow, Jr., John E. (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Statistical measurement

Reexamination Certificate

active

07467064

ABSTRACT:
Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.

REFERENCES:
patent: 6943900 (2005-09-01), Niu et al.
patent: 7092110 (2006-08-01), Balasubramanian et al.
patent: 2005/0060103 (2005-03-01), Chamness
patent: 2005/0143952 (2005-06-01), Tomoyasu et al.
User Guide to SIMCA-P 8.0: A new standard in multivariate data analysis, Umetrics AB.

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