Transfer mask, method of dividing pattern or transfer mask,...

Details Transfer mask, method of dividing pattern or transfer mask,... Transfer mask, method of dividing pattern or transfer mask,...

2005-02-15

2005-02-15

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S296000, C716S030000, C716S030000

Reexamination Certificate

active

06855467

ABSTRACT:
A pattern of a transfer mask to transfer, by the use of energy beams, a transfer pattern to a substrate is disclosed, the transfer mask made by forming an aperture pattern in a thin film portion supported by a supporting frame portion. When the transfer pattern includes a shielding pattern in which one part is connected to at least the periphery of the transfer mask, a shielding pattern portion, where the ratio of the surface area of the pattern surface portion on the transfer mask to a sectional area of a supporting portion is larger than 5000, is divided and developed.

REFERENCES:
patent: 5260151 (1993-11-01), Berger et al.
patent: 5798194 (1998-08-01), Nakasuji et al.
patent: 6200710 (2001-03-01), Hada
patent: 6261726 (2001-07-01), Brooks et al.
patent: 6638665 (2003-10-01), Kobinata
patent: 6732351 (2004-05-01), Yamashita
patent: 20030017401 (2003-01-01), Kawata et al.
International Search Report re application No. PCT/JP01/07649, mailed Dec. 4, 2001.

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