Transfer arm apparatus and semiconductor processing system using

Details Transfer arm apparatus and semiconductor processing system using Transfer arm apparatus and semiconductor processing system using

1997-11-25

2000-05-30

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Work support

156345WH, 414939, C23C 1600

Patent

active

060687045

ABSTRACT:
A transfer arm apparatus has first, second, and third arms. The second arm has a proximal link pivotally mounted on the distal end of the first arm, and first and second links connecting the proximal link and the third arm to constitute a link mechanism. The first and second links form a first pair of parallel links, and the proximal link and the third link form a second pair of parallel links connecting the first pair of parallel links. A transmission is contained in the first arm, and has an axial shaft and a hollow axial shaft coaxially arranged at the distal end of the first arm. The axial shaft transmits a rotational driving force to the first pair of parallel links, and the hollow axial shaft transmits a rotational driving force to the second pair of parallel links through the proximal link.

REFERENCES:
patent: 4951601 (1990-08-01), Maydan et al.
patent: 5151008 (1992-09-01), Ishida et al.
patent: 5333986 (1994-08-01), Mizukami et al.
patent: 5431529 (1995-07-01), Eastman et al.
patent: 5885052 (1999-03-01), Tsuji et al.

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