Transfer apparatus

Details Transfer apparatus Transfer apparatus

1992-08-26

1993-10-19

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134 953, 1341033, 1341041, 134902, B08B 302

Patent

active

052536637

ABSTRACT:
A rotary transfer arm for transferring semiconductor wafers is disposed in a closed housing. A closable opening portion is formed in the housing, through which the transfer arm can extend out from the housing. A fork is disposed at the distal end of the transfer arm. A plurality of holding grooves are formed in the fork to set a plurality of wafers with predetermined intervals between them. A cleaner for the fork is disposed in the upper portion of the housing. The cleaner has cleaning and drying nozzles mounted at the distal end of a switch arm. The switch arm can pivot between an operation position and a standby position. The switch arm can also move the cleaning and drying nozzles along the fork. During cleaning and drying, pure water is sprayed from the cleaning nozzles against the fork, and a drying gas is sprayed from the drying nozzles against it.

REFERENCES:
patent: 4282825 (1981-08-01), Nagatomo et al.
patent: 4519846 (1985-05-01), Aigo
patent: 4712573 (1987-12-01), Kuhl
patent: 4936328 (1990-06-01), Yatabe

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