Topography analyzing system

Details Topography analyzing system Topography analyzing system

2007-08-07

2007-08-07

Cygan, Michael (Department: 2855)

Measuring and testing

Surface and cutting edge testing

Roughness

C250S306000, C250S307000

Reexamination Certificate

active

11336241

ABSTRACT:
A topography analyzing system (10) for analyzing a topographic microstructure is provided. The topography analyzing system includes a three-dimensionally adjustable platform (12), a loading platform (13), a microscopic viewing device (14), a topography measuring device (11), and a mirror (15). The adjustable platform is adapted for adjusting the spatial positions of itself and what is loaded thereon. The loading platform is disposed on the adjustable platform and is adapted for having a workpiece (17) to be evaluated loaded thereon. The topography measuring device is aside/adjacent the adjustable platform. The topography measuring device includes a probe extending to and overhanging the workpiece for detecting topography of the workpiece. The mirror is secured at an adjustable angle relative to the three-dimensional adjustable platform and is adapted for forming a mirror image of the probe and a selected measuring area of the workpiece.

REFERENCES:
patent: 5473157 (1995-12-01), Grober et al.
patent: 5627365 (1997-05-01), Chiba et al.
patent: 5859364 (1999-01-01), Toda et al.
patent: 6545263 (2003-04-01), Lange et al.
patent: 6737646 (2004-05-01), Schwartz
patent: 2003/0005755 (2003-01-01), Schwartz

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