Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1982-12-28
1984-09-18
Bleutge, John C.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20415919, 20415911, 350 9623, 525920, 525922, 526301, 526302, G02B 514
Patent
active
044720190
ABSTRACT:
Radiation-curable coating compositions adapted for application to buffer-coated optical fibers are disclosed. These are intended to apply an adherent topcoat having greater toughness and greater hardness than the buffer coating. The new compositions comprise: (1) from 25% to 70% of diethylenic-terminated polyurethane, which may include urea linkages, the polyurethane being based on a diisocyanate having an average molecular weight of from 400 to 5000; (2) from 5% to 40% of a diethylenically unsaturated ester of a diglycidyl ether of a bisphenol, said ether having a molecular weight up to about 1000; and (3) from 5% to 30% of liquid radiation-curable monoethylenically unsaturated monomer having a T.sub.g above about 55.degree. C., especially N-vinyl pyrrolidone. Ultraviolet cures using acrylates as the ethylenic group are preferred.
REFERENCES:
patent: 3709866 (1973-01-01), Waller
patent: 4097439 (1978-06-01), Darling
patent: 4165265 (1979-08-01), Nakabayashi et al.
patent: 4319811 (1982-03-01), Tu et al.
Bishop Timothy E.
Cutler, Jr. Orvid R.
Pasternack George
Bleutge John C.
DeSoto, Inc.
Koeckert A. H.
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