Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Reexamination Certificate
2008-02-22
2010-06-01
Hamilton, Cynthia (Department: 1795)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
C430S273100, C430S311000, C430S272100
Reexamination Certificate
active
07728089
ABSTRACT:
A first aspect of the present invention is a topcoat composition, comprising: a copolymer represented by the formula (2):wherein n and m represent respective molar fractions such that n+m=1.
REFERENCES:
patent: 3402087 (1968-09-01), Yackel et al.
patent: 3992208 (1976-11-01), Nagata et al.
patent: 4792507 (1988-12-01), Yoshihara et al.
patent: 5130224 (1992-07-01), Kawabe et al.
patent: 5554486 (1996-09-01), Garza
patent: 5750312 (1998-05-01), Chandross et al.
patent: 5939236 (1999-08-01), Pavelchek et al.
patent: 6566021 (2003-05-01), Wang
patent: 6767587 (2004-07-01), Brown
patent: 6800418 (2004-10-01), Yoon et al.
patent: 6806026 (2004-10-01), Allen et al.
patent: 6835524 (2004-12-01), Hatakeyama et al.
patent: 6875552 (2005-04-01), Hishiro
patent: 7160665 (2007-01-01), Larson et al.
patent: 7402626 (2008-07-01), Maeda et al.
patent: 7473749 (2009-01-01), Ito et al.
patent: 2002/0102490 (2002-08-01), Ito et al.
patent: 2002/0146638 (2002-10-01), Ito et al.
patent: 2003/0003393 (2003-01-01), Yamaguchi et al.
patent: 2003/0022073 (2003-01-01), Wang
patent: 2003/0036016 (2003-02-01), Szmanda et al.
patent: 2003/0157430 (2003-08-01), Yoon et al.
patent: 2003/0165769 (2003-09-01), Prat et al.
patent: 2003/0228537 (2003-12-01), Yoon et al.
patent: 2004/0106755 (2004-06-01), Sumida et al.
patent: 2004/0170919 (2004-09-01), Kim et al.
patent: 2004/0214102 (2004-10-01), DiPietro et al.
patent: 2004/0225159 (2004-11-01), Komoriya et al.
patent: 2005/0202347 (2005-09-01), Houlihan et al.
patent: 2005/0286031 (2005-12-01), French et al.
patent: 2006/0188804 (2006-08-01), Allen et al.
patent: 2006/0292484 (2006-12-01), Ito et al.
patent: 2006/0292485 (2006-12-01), Ito et al.
patent: 2009/0136871 (2009-05-01), Ito et al.
patent: 2009/0142714 (2009-06-01), Ito et al.
patent: 244567 (1987-11-01), None
patent: WO0067072 (2000-11-01), None
patent: WO -2004/041762 (2004-05-01), None
Journal of Photopolymer Science and Technology, Table of Contents for vol. 17, No. 4 from http://www.jstage.jst.go.jp/browse/photopolymer/17/4/—contents, 5 pages,printed Mar. 24, 2009, with a release date of Mar. 23, 2005.
“hydrophilic defintion” Dictionary.com, copoy right 2009, LLC. 2 pages, downloaded Mar. 24, 2009. http://dictionary.reference.com/browse/hydrophic.
Google, first search page for “hydrophic definition”, 2 pages, generated Mar. 24, 2009, at http://www.google.com.
Weast, ed, CRC Handbook of Chemistry and Physics, 52nd Edition (1971-19720, the chemical Rubber company, Cleaveland, Ohio, no month given year published 1971, pp. B-13 and B-14.
Ito et al.; Fluoropolymer Resists: Fundamentals and Lithographic Evaluation; Journal of Photopolymer Science and Technology; vol. 17, No. 4 (2004); pp. 609-620.
Yamashita et al.; “Synthesis of fluorinated materials for 193 nm immersion lithography and 157 nm lithography”. Proceedings of SPIE, vol. 5753, Sturtevant, editor, May 2005, pp. 564-571.
Petrillo et al.; “Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications”; Journal of Vacuum Science & Technology B 16(6) Nov./Dec. 1998; 1998 American Vacuum Society; pp. 3709-3715.
Ito Hiroshi
Sundberg Linda Karin
Hamilton Cynthia
International Business Machines - Corporation
Schmeiser Olsen & Watts
LandOfFree
Topcoat compositions and methods of use thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Topcoat compositions and methods of use thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Topcoat compositions and methods of use thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4177310