Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Reexamination Certificate
2005-10-13
2009-06-09
Hamilton, Cynthia (Department: 1795)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
C430S273100, C438S952000
Reexamination Certificate
active
07544750
ABSTRACT:
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and a refractive index value n of less than 1.5 with respect to a radiation wavelength of 193 nm have been found which are especially useful as top antireflective coatings in 193 nm dry lithographic processes. Polymers with an ethylenic backbone and having fluorine and sulfonic acid moieties have been found to be especially useful. The compositions enable top reflection control at 193 nm while providing ease of use by virtue of their solubility in aqueous alkaline developer solutions.
REFERENCES:
patent: 5879853 (1999-03-01), Azuma
patent: 5994007 (1999-11-01), Sato et al.
patent: 6051364 (2000-04-01), Knors et al.
patent: 6057080 (2000-05-01), Brunsvold et al.
patent: 6114085 (2000-09-01), Padmanaban et al.
patent: 6251562 (2001-06-01), Breyta et al.
patent: 6274295 (2001-08-01), Dammel et al.
patent: 6309789 (2001-10-01), Takano et al.
patent: 6503689 (2003-01-01), Zampini et al.
patent: 2005/0014094 (2005-01-01), Lee et al.
patent: 2005/0026076 (2005-02-01), Lee
patent: 2005/0266354 (2005-12-01), Li et al.
patent: 2006/0134546 (2006-06-01), Huang et al.
patent: 2006/0134547 (2006-06-01), Huang et al.
patent: 2007/0009830 (2007-01-01), Huang et al.
patent: 2008/0124524 (2008-05-01), Yoshimura et al.
patent: 11124531 (1999-05-01), None
Takeshi Okino, et al. “Resists Using The Absorption Band Shift Method For ArF Excimer Laser Lithography”—Journal of Photopolymer Science and Technology, vol. 11, No. 3 (1998) pp. 489-492.
Yusuke Takano, et al. “Top Antireflective Coating Process for 193 nm Lithography” Jpn 1, Appl. Phys. vol. 41 (2002) pp. 4051-4054, Part1, No. 6B Jun. 2002.
Fenglian Bai, et al. “Alternating Copolymers of 2-Vinylnaphthalene and Methacrylic Acid in Aqueous Solution” Department of Chemistry and Center for Polymer Research, American Cemical Society (1987) pp. 384-411 from Photophysics of Polymers, ACS Symposium Series 358, American Chemical Society, Washington DC.
Y. Takano et al.: “Top Antireflective Coating Process for 193 NM Lithography” Japanese Journal of Applied Physics, vol. 41, 2002, pp. 4051-4054, XP001163390 Japan.
Heath William H.
Huang Wu-Song S.
Patel Kaushal S.
Varanasi Pushkara R.
Capella Steven
Hamilton Cynthia
International Business Machines - Corporation
LandOfFree
Top antireflective coating composition with low refractive... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Top antireflective coating composition with low refractive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Top antireflective coating composition with low refractive... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4116384