Tool for cleaning substrates

Details Tool for cleaning substrates Tool for cleaning substrates

2005-12-13

2005-12-13

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

With treating fluid motion

C134S034000, C134S109000, C134S111000, C134S108000, C134S184000, C134S195000, C134S902000, C034S364000, C034S576000

Reexamination Certificate

active

06974505

ABSTRACT:
A cleaning tool for cleaning substrates, comprising a circulation conduit through which is circulated a cleaning liquid or gas. The circulation conduit is disposed in fluid communication with an upstream flow chamber and a downstream cleaning chamber, the cross-sectional area of which cleaning chamber is less than the cross-sectional area of the flow chamber. In use, the cleaning chamber receives a wafer substrate for cleaning of particles or removal of polymer films from the substrate. The smaller cross-sectional area of the cleaning chamber accelerates the flow of a cleaning fluid flowing through the cleaning chamber from the flow chamber. The rapidly-flowing cleaning fluid removes the particles and/or films from the substrate while preventing dropping of the removed particles or re-deposition of the film back onto the substrate. A particle filter may be provided in the circulation conduit downstream of the cleaning chamber for removing the particles.

REFERENCES:
patent: 5009240 (1991-04-01), Levi
patent: 5948173 (1999-09-01), Huh et al.

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