Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Post imaging process – finishing – or perfecting composition...
Patent
1998-10-23
2000-06-06
Goodrow, John
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Post imaging process, finishing, or perfecting composition...
430124, G03G 9087
Patent
active
060716649
ABSTRACT:
Dry toner particles with a resinous matrix containing a mixture of a polymer (LPC) with low softening point and tg.delta.>3, modified by a modifier (D) selected from the group consisting of long chain aliphatic compounds with a reactive end group and having between 20 and 250 carbon atoms and a polysiloxane, said modifier and said polymer being present in a molar ratio LPC/D between 0.8 and 1.25 and a non-linear polymer with a softening point T.sub.sB such that 110.degree. C. .ltoreq.T.sub.sB .ltoreq.135.degree. C. The toner particles further contain a wax chosen from waxes having a melting point near to the softening point of the branched polymer B.
REFERENCES:
patent: 5344737 (1994-09-01), Berkes et al.
patent: 5578409 (1996-11-01), Kotaki et al.
patent: 5587265 (1996-12-01), Nakadera et al.
patent: 5629121 (1997-05-01), Nakayama
patent: 5712074 (1998-01-01), Sato et al.
patent: 5738965 (1998-04-01), Nakadera et al.
patent: 5756244 (1998-05-01), Omatsu et al.
patent: 5853940 (1998-12-01), Kido et al.
de Beeck Werner Op
De Meutter Stefaan
Tavernier Serge
Tersago Geert
Agfa-Gevaert N.V.
Goodrow John
LandOfFree
Toner particles containing a mixture of a modified linear polyme does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Toner particles containing a mixture of a modified linear polyme, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Toner particles containing a mixture of a modified linear polyme will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2211865