Titanium-tungsten target material and manufacturing method there

Stock material or miscellaneous articles – All metal or with adjacent metals – Having metal particles

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420430, 419 31, 419 33, 419 46, 419 47, 419 49, 419 52, B22F 316

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053065697

ABSTRACT:
A titanium-tungsten target material capable of limiting the amount of particles generated during sputtering and a method of manufacturing this titanium-tungsten material. The titanium-tungsten target material has a titanium-tungsten alloy phase which occupies 98% or more of the whole area of the material as observed in a micro-structure thereof. In one example of the manufacturing method, an ingot obtained by melting tungsten and titanium is processde by a solution treatment to form a titanium-tungsten target, or a power obtained by melting the ingot is sintered to form a target. Preferably, the melting may be performed under reduced pressure in an electron beam melting manner. In another example of the manufacturing method, a powder is formed from a molten metal by an atomization method and the obtained powder is sintered to form a titanium-tungsten target. For sintering of the powder, it is preferable to apply hot isostatic pressing or hot pressing.

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Jenkins et al. (Eds.) "Powder Metallurgy; An Overview", 1991, 22-29, The Institute of Metals (London).
International Journal of Refractory Metals and Hard Materials vol. 9, No. 3, Sep. 1990, Amsterdam, NL pp. 146-153, M. Yamauchi et al. `Development of W-Ti Binary Alloy Sputtering Target and Study of Its Sputtering Characteristics` p. 148, right-hand column "Microstructure of W-Ti Binary Alloy".
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