Titanium-indiffusion waveguides and methods of fabrication

Details Titanium-indiffusion waveguides and methods of fabrication Titanium-indiffusion waveguides and methods of fabrication

2005-02-15

2005-02-15

Bovernick, Rodney (Department: 2874)

Optical waveguides

Planar optical waveguide

Thin film optical waveguide

C385S131000, C385S129000, C065S030130

Reexamination Certificate

active

06856746

ABSTRACT:
A method for fabricating titanium-indiffusion waveguides in optical modulators and other optical waveguide devices includes disposing titanium, strips in a waveguide pattern on the surface of a crystalline substrate, such as lithium niobate or lithium tantalate, and indiffusing the titanium atoms into the crystalline substrate by creating a flowing, wet deuterium oxide (D2O) environment, raising the temperature in the D2O environment to a temperature within the range of 900 degrees Celsius and 1100 degrees Celsius and maintaining the temperature for a period of time that will allow for the necessary indiffusion of titanium to occur within the crystal substrate. The Ti-indiffusion waveguides that result from performing the Ti-indiffusion process in a flowing, wet D2O environment include crystalline substrates, such as lithium niobate or lithium tantalate, titanium strips disposed in a waveguide pattern on the crystalline substrate and a diffusion region resulting from high temperature processing in a flowing, wet D2O environment.

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