Titanium-containing silicon nitride film bodies and a method of

Details Titanium-containing silicon nitride film bodies and a method of Titanium-containing silicon nitride film bodies and a method of

1981-08-31

1984-09-04

Dixon, Jr., William R.

Compositions: ceramic

Ceramic compositions

Refractory

428446, 428698, 428408, 252502, B32B 900

Patent

active

044698011

ABSTRACT:
Titanium-containing silicon nitride film bodies include a film body having an essentially amorphous structure and containing particle-like titanium nitride, a film body consisting mainly of .alpha.-type crystal and containing particle-like TiN deposited in the crystal and having a crystal orientation of crystal face (OOl), and a film body consisting mainly of .beta.-type crystal and containing column-like TiN deposited in the crystal along the c-axis direction thereof and having a crystal orientation of crystal face (OOl), which are produced by blowing a nitrogen depositing source, a silicon depositing source and a titanium depositing source on a substrate heated at 500.degree.-1,900.degree. C. by means of a blowpipe composed of a pipe assembly to perform chemical vapordeposition reaction.

REFERENCES:
patent: 4145224 (1979-03-01), Mehalchick et al.
patent: 4178415 (1979-12-01), Ovshinsky et al.
patent: 4208215 (1980-06-01), Kleiner et al.
patent: 4216021 (1980-08-01), Hattori et al.
patent: 4312899 (1982-01-01), Lahmann
patent: 4312924 (1982-01-01), Hirai et al.

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