Tin electroplating process

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal or alloy coating on...

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205104, 205254, 205302, 205303, C25D 518

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active

057500177

ABSTRACT:
A process for plating tin or tin alloy onto metal substrates is described. In the process, a metal substrate is placed in an electroplating bath that contains a stannous sulfate and an organic compound additive in which the organic compound has a heterocyclic moiety in an aqueous solution of sulfonic acid. The bath is then subjected to pulse plating conditions that plate a layer of tin or tin alloy onto the metal substrate wherein the tin in the tin layer has a grain size of about 2 .mu.m to about 8 .mu.m. During pulse plating, a current density of about 65 ASF to about 250 ASF is applied to the electroplating bath in a pulsed manner, i.e. the current is cycled on and off during plating. The duty cycle of the pulse is about twenty-five percent to about thirty percent. The duration of the on pulse during the cycle is about 50 .mu.s to about 500 .mu.s.

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"Tin Whiskers: A Case Study", by McDowell, M. E. Captain, USAF, Los Angeles Air Force Base, pp. 207-215. no date available.
"Microstructural Characterization of Electrodeposited Tin Layer", by Selcuker, A. et al., Vitramon, Inc. Box 544, Bridgeport, CT., pp. 19-22. no date available.
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"Grain Size Effect of Electro-Plated Tin Coatings on Whisker Growth", by Kakeshita, T. et al., Journal of Materials Science 17 pp. 2560-2566 (1982). (no month available).

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