TI--CR--AL--O thin film resistors

Electrical resistors – With base extending along resistance element – Resistance element coated on base

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

338306, 25252021, 25251912, 427101, H01C 1012

Patent

active

061541192

ABSTRACT:
Thin films of Ti--Cr--Al--O are used as a resistor material. The films are rf sputter deposited from ceramic targets using a reactive working gas mixture of Ar and O.sub.2. Resistivity values from 10.sup.4 to 10.sup.10 Ohm-cm have been measured for Ti--Cr--Al--O film <1 .mu.m thick. The film resistivity can be discretely selected through control of the target composition and the deposition parameters. The application of Ti--Cr--Al--O as a thin film resistor has been found to be thermodynamically stable, unlike other metal-oxide films. The Ti--Cr--Al--O film can be used as a vertical or lateral resistor, for example, as a layer beneath a field emission cathode in a flat panel display; or used to control surface emissivity, for example, as a coating on an insulating material such as vertical wall supports in flat panel displays.

REFERENCES:
patent: 2590893 (1952-01-01), Sanborn
patent: 2590894 (1952-04-01), Sanborn
patent: 2797175 (1957-06-01), Horton
patent: 4780702 (1988-10-01), Snel et al.
patent: 5001454 (1991-03-01), Yamadera et al.
patent: 5783315 (1998-07-01), Schaeffer et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

TI--CR--AL--O thin film resistors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with TI--CR--AL--O thin film resistors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and TI--CR--AL--O thin film resistors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1729963

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.