Static information storage and retrieval – Floating gate – Particular connection
Reexamination Certificate
2008-03-04
2008-03-04
Nguyen, Tuan T. (Department: 2824)
Static information storage and retrieval
Floating gate
Particular connection
C365S185050, C365S185240, C365S201000
Reexamination Certificate
active
07339826
ABSTRACT:
An NROM (nitride read only memory) cell, which is programmed by channel hot electron injection and erased by hot hole injection, includes a charge trapping structure formed of: a bottom oxide layer, a charge trapping layer; and a top oxide layer. The bottom oxide layer is no thicker than that which provides margin stability.
REFERENCES:
patent: 7116577 (2006-10-01), Eitan
patent: 7164603 (2007-01-01), Shih et al.
patent: 7209390 (2007-04-01), Lue et al.
patent: 7242622 (2007-07-01), Hsu et al.
patent: 2004/0136220 (2004-07-01), Cohen
patent: 2005/0111257 (2005-05-01), Eitan
M. Specht, et al. “Novel Dual Bit Tri-Gate Charge Trapping Memory Devices”, IEEE Electron Device Letters vol. 25, No. 12, Dec. 12, 2004.
U.S. Appl. No. 11/007,332, Maayan et al.
U.S. Appl. No. 10/695,449, Cohen et al.
EMPK & Shiloh, LLP
Nguyen Tuan T.
Saifun Semiconductors Ltd.
LandOfFree
Threshold voltage shift in NROM cells does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Threshold voltage shift in NROM cells, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Threshold voltage shift in NROM cells will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2788697