Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-02-03
1990-04-03
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430171, 430175, 430176, 430302, 534559, 534560, 534561, 534565, G03C 154, C07C11304
Patent
active
049140000
ABSTRACT:
A light-sensitive compound having the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of phenyl and C.sub.1 to C.sub.4 alklyl substituted phenyl.
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patent: 4299907 (1981-11-01), Burkle et al.
patent: 4436804 (1984-03-01), Walls
patent: 4749639 (1988-06-01), Frommold
Bowers Jr. Charles L.
Hoechst Celanese Corporation
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