Three dimensional polysilicon resistor for integrated circuits

Electrical resistors – With base extending along resistance element – Resistance element mounted in a groove in base

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338310, 338252, 338312, 296101, 29620, 257538, H01C 1012

Patent

active

058670874

ABSTRACT:
A three dimensional polysilicon resistor and a method by which the three dimensional polysilicon resistor is manufactured. A semiconductor substrate has formed upon its surface an insulating layer. The insulating layer has a minimum of one aperture formed at least partially through the insulating layer. A polysilicon layer is formed upon the insulating layer and formed conformally into the aperture(s) within the insulating layer. The polysilicon layer is then patterned to form a resistor which includes the portion of the polysilicon layer which resides within the aperture(s).

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