Three dimensional imaging system

Photocopying – Projection printing and copying cameras – Step and repeat

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G03B 2742

Patent

active

058220429

ABSTRACT:
The photolithography tool of the present invention in its simplest embodiment includes an afocal lens system and a three-dimensional master or mask. The three-dimensional mask is located within the object space of the afocal lens system and is imaged onto a three-dimensional circuit carrier or substrate located within the imaging space of the afocal lens system. By using an afocal lens, with which persons skilled in instrumental optics are familiar, a system can be designed for which the object space is identical to the imaging space for unity magnification. As a result, a mask can be used in which the surface contour and pattern to be imaged is identical to the desired substrate surface and pattern, thereby simplifying mask design.

REFERENCES:
patent: 2380210 (1945-07-01), Bennett
patent: 2445594 (1948-07-01), Bennett
patent: 3506344 (1970-04-01), Petit
patent: 3694080 (1972-09-01), Malsky
patent: 3748015 (1971-06-01), Offner
patent: 4758864 (1988-07-01), Endo et al.
patent: 4867545 (1989-09-01), Wakimoto et al.
IBM Technical Disclosure Bulletin, vol. 30, No. 3, Aug. 1987 New York US pp. 1020-1024.
"Fast Automated Projection System for Printed Circuit Boards".
IBM Technical disclosure Bulletin, vol. 13, No. 4, Sep. 1970, New York, US pp. 879-880.
"Three-Dimensional Photolithographic Mask".

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