Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property or radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-03-11
2008-03-11
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property or radiation sensitive...
Radiation sensitive composition or product or process of making
C430S916000, C430S926000, C430S270100, C430S281100, C430S286100, C430S287100, C522S027000, C560S147000
Reexamination Certificate
active
07341828
ABSTRACT:
A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
REFERENCES:
patent: 3115509 (1963-12-01), Mack
patent: 3144422 (1964-08-01), Homberg
patent: 4020233 (1977-04-01), Morgan
patent: 5876805 (1999-03-01), Ostlie
patent: 6455207 (2002-09-01), Katoh et al.
patent: 6503961 (2003-01-01), Okazaki et al.
patent: 2002/0115819 (2002-08-01), Primel et al.
patent: 1 118 776 (1961-12-01), None
patent: 0 900 800 (1999-03-01), None
patent: 1 173 524 (2002-01-01), None
patent: 10-253815 (1998-09-01), None
patent: WO 01 25302 (2001-04-01), None
Scigalski et al (Chem. Abstract 2001:718595 for “Xanthene Dyes and Amino Acid Containing Thioether or Mercaptan Groups as Potential Components of Photoinitiating Compositions for Radical Polymerization”, Polimery (2001), vol. 46(9), p. 613-621).
Communication from Chinese Patent Office dated Jan. 10, 2006.
Chinese Office Action dated Mar. 23, 2007.
Kamata Hirotoshi
Katoh Tsuyoshi
Onishi Mina
Lee Sin J.
Showa Denko K.K.
Sughrue & Mion, PLLC
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