Thiol compound and photosensitive composition using the same

Details Thiol compound and photosensitive composition using the same Thiol compound and photosensitive composition using the same

2005-10-25

2009-11-24

McClendon, Sanza L (Department: 1796)

Organic compounds -- part of the class 532-570 series

Organic compounds

Sulfur containing

C568S062000, C568S717000, C568S718000, C568S071000, C568S061000, C568S001000, C568S018000, C568S721000, C568S809000

Reexamination Certificate

active

07622613

ABSTRACT:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

REFERENCES:
patent: 0 987 567 (2000-03-01), None
patent: 1 057 808 (2000-12-01), None
patent: 08059775 (1996-03-01), None
patent: 10-253815 (1998-09-01), None
patent: 10-253816 (1998-09-01), None
patent: 10-253817 (1998-09-01), None
patent: 2000-249822 (2000-09-01), None
patent: 2004-149755 (2004-05-01), None
English language machine translation of JP 08-059775.
Mitsuaki Yamada et al., “Synthesis of Fluorenebisphenoxy Derivatives by Acid-sulfur Compound Catalyzed Condensation Reaction”, Chemistry Letters, vol. 10, 1998, p. 1055-1056.

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