Thin organic alignment layers with a batch process for...

Details Thin organic alignment layers with a batch process for... Thin organic alignment layers with a batch process for...

2006-12-01

2011-12-13

Meeks, Timothy (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

C427S058000

Reexamination Certificate

active

08075953

ABSTRACT:
A method to form alignment layers on a substrate of an LCD is disclosed. The substrate is placed in a vacuum chamber and undergoes a purging process. The purging process heats the substrates and removes water vapor from the vacuum chamber. Specifically, the vacuum chamber is evacuated to a low pressure and refilled with a preheated inert gas. Evacuation of the vacuum chamber and refilling of the vacuum chamber is repeated several times. The alignment layer is then deposited using vapor deposition. Alternatively, plasma enhanced vapor deposition can be used for depositing the alignment layer. Furthermore, plasma cleaning prior to the deposition of the alignment layer can used clean the substrate.

REFERENCES:
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patent: 6339459 (2002-01-01), Ichikawa et al.
patent: 6352594 (2002-03-01), Cook et al.
patent: 6461437 (2002-10-01), Kubota et al.
patent: 6724449 (2004-04-01), Andry et al.
patent: 6830831 (2004-12-01), O'Neill et al.

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