Thin layer depositing apparatus

Details Thin layer depositing apparatus Thin layer depositing apparatus

1982-03-10

1984-08-21

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044668767

ABSTRACT:
A thin layer depositing apparatus comprising a reaction vessel for putting therein substrates to be provided with a desired thin layer and a gas accelerating nozzle positioned at a desired portion of the reaction vessel so that reactive gas is introduced in the reaction vessel through the gas accelerating nozzle.

REFERENCES:
patent: 3408283 (1968-10-01), Chopra et al.
patent: 3409529 (1968-11-01), Chopra et al.
patent: 4307283 (1981-12-01), Zajac
patent: 4353777 (1982-10-01), Jacob

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