Thin-film vapor deposition apparatus

Details Thin-film vapor deposition apparatus Thin-film vapor deposition apparatus

1996-04-19

1999-08-10

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, C23C 1600

Patent

active

059353376

ABSTRACT:
A thin-film vapor deposition apparatus has a reaction casing defining a reaction chamber, a stage for supporting a substrate, the stage being disposed in the reaction chamber, and a shower head supported on the reaction casing in confronting relation to the stage for discharging a material gas toward the substrate on the stage for depositing a thin film on the substrate. A plurality of flow path systems are disposed in various regions of the shower head and the reaction casing for passage therethrough a heating medium to control the temperatures of the regions under the control of a temperature controller.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin
patent: 4625678 (1986-12-01), Shioya
patent: 5106453 (1992-04-01), Benko et al.
patent: 5653806 (1997-08-01), Van Buskirk
Chinoy et al., "A Novel Reactor for Large-Area Epitaxial Solar Cell Materials", vol. 30, No. 1, pp. 323-335, May 1, 1991.

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