Active solid-state devices (e.g. – transistors – solid-state diode – With shielding
Reexamination Certificate
2006-01-17
2006-01-17
Prenty, Mark V. (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
With shielding
C257S411000, C257S059000, C257S072000
Reexamination Certificate
active
06987311
ABSTRACT:
A method for fabricating thin film transistors (TFT) of a TFT-LCD. The method first forms a gate electrode of the TFT in a transistor area of a substrate. Then a first dielectric layer, a light shielding layer, a second dielectric layer, a semiconductor layer, a doped silicon conductive layer and a second metal layer are sequentially formed on the gate electrode so as to form the TFT in the transistor area. A channel area is defined in the TFT for separating the second metal layer and the doped silicon conductive layer so as to respectively form a source electrode and a drain electrode of the TFT. Finally, a passivation layer and a transparent conductive layer are sequentially formed on the drain electrode, and the transparent conductive layer is connected with the drain electrode through a first via hole of the passivation layer.
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Lu Rung-Nan
Yang Chung-Hsien
Chi Mei Optoelectronics Corporation
Hsu Winston
Prenty Mark V.
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