Thin-film transistor, thin-film transistor sheet and their...

Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S288000, C257SE29117

Reexamination Certificate

active

07573062

ABSTRACT:
Disclosed are a process of manufacturing a thin-film transistor sheet and a thin-film transistor sheet manufactured by the process, the process comprising the steps of providing a gate busline on a substrate, providing, on the surface of the substrate on the gate busline side, an insulation layer capable of receiving a fluid electrode material, supply the fluid electrode material to the insulation layer, the fluid electrode material being allowed to permeate the insulation layer, forming a gate electrode from the permeated fluid electrode material to be in contact with the gate busline, forming a gate insulating layer on the gate electrode, and forming a semiconductor layer on the gate insulating layer.

REFERENCES:
patent: 5780326 (1998-07-01), Dennison et al.
patent: 6330042 (2001-12-01), Kang et al.
patent: 6331356 (2001-12-01), Angelopoulos et al.
patent: 6335539 (2002-01-01), Dimitrakopoulos et al.
patent: 6794220 (2004-09-01), Hirai et al.
patent: 6949762 (2005-09-01), Ong et al.
patent: 2002/0025391 (2002-02-01), Angelopoulos et al.
patent: 2008/0277724 (2008-11-01), Qi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thin-film transistor, thin-film transistor sheet and their... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin-film transistor, thin-film transistor sheet and their..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin-film transistor, thin-film transistor sheet and their... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4122792

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.