Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1995-02-22
1996-04-16
Monin, Jr., Donald L.
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257 59, 257 66, 257401, H01L 2170, H01L 4500
Patent
active
055085318
ABSTRACT:
There is provided a TFT having a trench surrounding gate structure that is capable of decreasing the leakage current generated during the Off-State of the TFT by securing enough channel length despite the smallness of the area, increasing the driving current by securing a sufficient cross-sectional area of an inverted channel during the On-State of the TFT, and improving the resolution of the LCD by reducing the space occupied by the TFT in the panel during the manufacturing of the LCD.
REFERENCES:
patent: 5160491 (1992-11-01), Mori
patent: 5188973 (1993-02-01), Omura et al.
patent: 5229310 (1993-07-01), Sivan
patent: 5250450 (1993-10-01), Lee et al.
Hyundai Electronics Industries Co,. Ltd.
Monin, Jr. Donald L.
LandOfFree
Thin film transistor (TFT) and method of manufacturing thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin film transistor (TFT) and method of manufacturing thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film transistor (TFT) and method of manufacturing thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-327106