Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor...
Reexamination Certificate
2005-03-01
2005-03-01
Crane, Sara (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
C438S487000
Reexamination Certificate
active
06861668
ABSTRACT:
The present invention provides a simple method for forming the poly-Si and single crystalline Si TFT, which includes forming a line peninsular layer extending from an a-Si island layer at the active region. Then, a laser annealing process is performed, so that the re-crystallization will occur starting from an end of the line peninsular layer and then form the silicon island layer, serving as the active region for the TFT.
REFERENCES:
patent: 4269631 (1981-05-01), Anantha et al.
Crane Sara
Jiang Chyun IP Office
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