Thin film transistor (TFT) and method for fabricating the TFT

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor...

Reexamination Certificate

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C438S487000

Reexamination Certificate

active

06861668

ABSTRACT:
The present invention provides a simple method for forming the poly-Si and single crystalline Si TFT, which includes forming a line peninsular layer extending from an a-Si island layer at the active region. Then, a laser annealing process is performed, so that the re-crystallization will occur starting from an end of the line peninsular layer and then form the silicon island layer, serving as the active region for the TFT.

REFERENCES:
patent: 4269631 (1981-05-01), Anantha et al.

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