Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Patent
1995-12-15
1998-10-13
Thomas, Tom
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
257 59, H01L 2941, H01L 29786
Patent
active
058215654
ABSTRACT:
A thin film transistor structure for use in driving liquid crystal display elements has a semiconductor active layer, a control electrode layer underlying the active layer with an insulating layer interposed therebetween and first and second main electrode layers formed on or above the active layer in a spaced relation with each other to define a channel in the active layer in cooperation with the control electrode layer between the main electrode layers. The active layer has a first peripheral edge portion generally perpendicular to the direction of the channel and a second peripheral edge portion generally not perpendicular to the direction of the channel. The first and/or second main electrode layer extends over the first and/or second peripheral edge portion of the active layer such that at least a part of the first peripheral edge portion and/or at least part of the second peripheral edge portion of the active layer has its side face directly covered with the main electrode layer.
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Newest Amorphous Silicon Handbook, 1983, p. 386.
Official Action for JP No. 63-159098, dated Dec. 10, 1996 (2 pages), with Partial English Translation (1 page).
Kenmotsu Akihiro
Koshita Toshiyuki
Matsuzaki Eiji
Nakatani Mitsuo
Takano Takao
Hardy David B.
Hitachi , Ltd.
Thomas Tom
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