Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2011-06-14
2011-06-14
Smith, Bradley K (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
C257SE29117
Reexamination Certificate
active
07960729
ABSTRACT:
In a thin film transistor (TFT) structure, formation of a spacer layer is used for isolating the NI junction from an insulating layer comprising a nitride, so as to decrease the amount of current leakage and improve the electric characteristics of TFT. In a back-channel etching (BCE) type TFT device, the spacer layer (comprising an oxide layer) is substantially formed at the sidewalls of the channel regions to isolate the insulating layer (comprising silicon nitride) from the NI junctions. In an etch-stop TFT device, the spacer layer (comprising an oxide layer) is substantially formed at the sidewalls of the etch-stop layer to isolate the insulating layer (i.e. etch-stop layer) from the NI junctions.
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AU Optronics Corp.
Movva Amar
Smith Bradley K
Thomas|Kayden
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