Thin film transistor, method of fabricating the same, and...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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C257SE29273, C257SE29292, C257SE29294

Reexamination Certificate

active

07999262

ABSTRACT:
A thin film transistor includes a gate electrode, a gate insulation layer on the gate electrode, source and drain electrodes formed on the gate insulation layer, a polysilicon channel layer overlapping the ohmic contact layers and on the gate insulation layer between the source and drain electrodes, ohmic contact regions over the source and drain electrodes for contacting the polysilicon channel to the source and drain electrodes, and doping layers over the source and drain electrodes.

REFERENCES:
patent: 5681760 (1997-10-01), Park
patent: 5827760 (1998-10-01), Seo
patent: 6083779 (2000-07-01), Seo
patent: 6514801 (2003-02-01), Yudasaka et al.
patent: 6580127 (2003-06-01), Andry et al.
patent: 7361529 (2008-04-01), Chabinyc et al.

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