Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Reexamination Certificate
2007-04-05
2009-06-23
Ngo, Ngan (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
C257S347000, C257S350000, C257SE31041, C257SE29117, C257SE29151
Reexamination Certificate
active
07550771
ABSTRACT:
A thin film transistor includes a metal substrate, a first conductive barrier layer placed on the metal substrate to prevent diffusion of substance of the metal substrate, a protective insulating film placed on the first conductive barrier layer, a semiconductor layer placed on the protective insulating film and including a source region, a drain region and a channel region, a gate insulating film placed on the semiconductor layer, and a gate electrode placed above the semiconductor layer with the gate insulating film interposed therebetween. The first conductive barrier layer and the semiconductor layer are electrically connected through a first opening of the protective insulating film.
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Liu Benjamin Tzu-Hung
Mitsubishi Electric Corporation
Ngo Ngan
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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