Thin film transistor, manufacturing method therefor and liquid c

Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal

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257 66, 257 72, G02F 1136, H01L 2976, H01L 310312

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active

060347481

ABSTRACT:
With a conventional thin film transistor comprising a plurality of series-connected thin film transistors each having a plurality of LDD structures, leakage current can be decreased to a large effect but the area of an element can hardly be reduced. By connecting gate electrodes (15) of a plurality of thin film transistors only with an implanted region (13b) which is formed by implanting an impurity at a low concentration into a semiconductor thin film employed as an active layer, both reduction in element size and decrease in leakage current can be realized.

REFERENCES:
patent: 5693959 (1997-12-01), Inoue et al.
patent: 5834797 (1998-11-01), Yamanaka
International Display Research Conference '93, by Y. Hayashi et al., pp. 465-468.

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